Simultaneous Template Optimization and Mask Assignment for ... · Y. Badr, et al., “Mask...
Transcript of Simultaneous Template Optimization and Mask Assignment for ... · Y. Badr, et al., “Mask...
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Simultaneous Template Optimization and MaskAssignment for DSA with Multiple Patterning
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Jian Kuang, Junjie Ye, Evangeline F.Y. Young
Department of Computer Science and Engineering
The Chinese University of Hong Kong
香 港 中 文 大 學
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Outline Introduction to DSA & Multiple Patterning Problem Formulation DSA with Double Patterning DSA with Triple Patterning Results & Conclusions
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DSA Directed Self-Assembly contact/via manufacturing promising Next Generation Lithography for 10nm
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DSA guiding templates are needed to form the vias
(contacts) correctly single-hole template v.s. multiple-hole template costs of templates: # of holes, irregular shape, distance
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Multiple patterning divide the features into multiple masks coloring problem
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DSA + multiple patterning
Step 1: multiple masks to print templates
Step 2: templates to guide the DSA process
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DSA + multiple patterning for two vias within a threshold-distance
on different masks or
on the same mask & grouped (in the same template)
otherwise, an UnResolved Conflict (URC) occurs
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template cost reduced
URC
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DSA + multiple patterning DSA with double patterning (2 masks)
DSA with triple patterning (3 masks)
simultaneously perform grouping (into the same template) and mask assignment
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Outline Introduction to DSA & Multiple Patterning Problem Formulation DSA with Double Patterning DSA with Triple Patterning Results & Conclusions
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Conflict graph G(V, Eg∪En) nodes: vias (V) edges: inter-distance < threshold
dash edges: grouping edges (Eg) two vias can be grouped (into the same template) only horizontally/vertically aligned vias can be grouped
solid edges : non-grouping edges (En)
10close & aligned
build graph
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Incompatible grouping a set of grouping edges are incompatible if they
cannot be used for grouping at the same time when max_template_size = 2 (single-hole or 2-
hole templates only), any adjacent grouping edges are incompatible
e1 and e2 are incompatible11
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Problem definition Given a layout of contacts/vias and N masks, assign the features
to different masks and group some of the features
such that no incompatible groupings happen minimize # of URCs (unresolved conflicts)
minimize total cost of the used DSA templates
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Outline Introduction to DSA & Multiple Patterning Problem Formulation DSA with Double Patterning DSA with Triple Patterning Results & Conclusions
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Simplified graph problem
G(V, Eg∪En) set edge cost set incompatible constraints
N-color (2 or 3-color) graph and minimize cost of invalid edges (edges whose end-nodes have the same color)
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𝑐𝑜𝑠𝑡 𝑒 = {𝑇𝑒𝑚𝑝𝑙𝑎𝑡𝑒_𝑐𝑜𝑠𝑡 𝑒 , 𝑖𝑓𝑒 ∈ grouping
𝑈𝑅𝐶𝑐𝑜𝑠𝑡, 𝑖𝑓 𝑒 ∉ grouping
cost = cost(e1)+cost(e2)
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Simplified graph problem
N-color (2 or 3-color) graph and minimize cost of invalid edges
Simplified Graph Problem:delete min-cost edges to make remaining graph N-colorable
If a grouping edge (a,b) is removed: a and b are grouped If a non-grouping edge (a,b) is removed: a and b has a URC
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cost = cost(e1)+cost(e2)
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Dividing conflict graph identify bridges, independent components… to divide
conflict graph into subgraphs
in highly dense layout, more than 99.9% of the subgraphs are planar
first solve planar subgraphs non-planar graphs can be modified to planar
first assume max_template_size = 216
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Exact method for Simplified Graph Problem
Constrained Edge Deletion Bipartite Problem
Constrained Odd Vertex Pairing (OVP) on dual graph
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2-colorable
dual graph
A B C D: faces
OVP: remove edge to make graph w/o odd-degree vertex
a graph is 2-colorable iff no odd cycle
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Exact method for Simplified Graph Problem
Constrained OVP
a set of subproblemseach subproblem is OVP w/o constraints
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Finding all subproblems edge constraint graph
all subproblems all maximal independent sets of
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Maximal Independent Set: adding any element will make it not independent
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Algorithm
for each maximal independent set Imodify weights of grouping edges I as ∞ call OVP solver edges I will not be removed edges I may or may not be removed
it is guaranteed removed grouping edges are always compatible the minimum cost result returned by OVP solver is
optimal20
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Accurate formulation on graph
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Simplified: If a grouping edge (a,b) is removed: a and b are grouped
Accurate: If a grouping edge (a,b) is removed: a and b are grouped or a and b has a URC (2 vias that can be grouped can also have a URC)
reduce from accurate to simplified by adding dummy nodes/edges
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Extension to larger templates max_template_size > 2
Problem: how to calculate cost of larger templates accurately?
Solution: add dummy nodes and edges to graph
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Outline Introduction to DSA & Multiple Patterning Problem Formulation DSA with Double Patterning DSA with Triple Patterning Results & Conclusions
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LUT based method Problem: remove edge to make graph 3-colorable
divide the conflict graph to subgraphs build LUT of small graphs
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match
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Match with LUT
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yes
no
3-colorable?
map color
remove edge
heuristic to modify graph
yes
no
matched?
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Critical /Semi-critical edge for each non-3-colorable graph in LUT
critical edge: its removal make a graph 3-colorable semi-critical edge: after removing it, there will be
removable (degree < 3) nodes
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criticalsemi-criticalothers
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Algorithm for removing edges e=min-cost critical edge
e is grouping edge: return removing e (optimal)
e is non-grouping edge or e=null: try to remove each semi-critical edge se simplify graph and recursively call the algorithm get a set of possible solutions and find min-cost one
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semi-critical
critical
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Outline Introduction to DSA & Multiple Patterning Problem Formulation DSA with Double Patterning DSA with Triple Patterning Results & Conclusions
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Results for DSA + Double Patterning
29Y. Badr, et al., “Mask assignment and synthesis of DSA-MP hybrid lithography for sub-7nm contacts/vias,” in Proc. DAC, June 2015.
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DAC'15
Ours
target at 10nm Via1 and Via2
significantly reduce URC# and Template Cost
resolve 400,000 vias in 2.8 seconds
verified by ILP: our result is optimal for planar graphs
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Results for DSA + Triple Patterning
30Y. Badr, et al., “Mask assignment and synthesis of DSA-MP hybrid lithography for sub-7nm contacts/vias,” in Proc. DAC, June 2015.
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reduction on Template Cost is even larger
resolve 400,000 vias within 3.6 seconds
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Conclusions
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DSA + Double/Triple Patterning
Co-optimize template cost and mask assignment
Reduce manufacturing cost remarkably
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Thanks!
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