1
Array
Mask
5Mask


PR



PR

Glass
Glass
5Mask
AFST01
AFST08
AFST04
AFST03
AFST02
AFST09
AFST11
AFST12
AFST14
AFST10
AFST07
A3
A1
A2
AFST13
AFST15
AFST18
EV
ATGT01
AEWS07
4Mask--

glass
Roll Brush3µmSW
Suction Bubble JetDI waterbubbleparticle3∼5 µmparticleBJ
AQK(aqua knife)slitNozzleDIWfinal cleaning
AKair knife AKslit Nozzleslit nozzle
1. Unpack & Initial Clean
glass
sputter
2. Gate Deposition

2. Gate Deposition --- Sputter
THIN FILM,2Glow Discharge
Sputter Chamber
Transfer Chamber
L/UL Chamber
Transfer System

TFT patternTFT patternTFT pattern.
3. Gate Mask --- Cleaning
PRPRMura
Spray, 5
3. Gate Mask --- Bake
PR
Slit
3. Gate Mask --- Interface

3. Gate Mask --- Aligner
MIRROR PROJETION MASK ALIGNER(MASK
glass
mask
3. Gate Mask --- Developer
DeveloperPR
4. Gate Wet Etch
4. Gate Wet Etch

4. Gate Wet Etch
Al 4AL +2HNO3 → 2AL2O3 + N2 + H2
H3PO4 + AL2O3 → AL(PO4) + H2O
H3PO4 + Mo2O3 → Mo(PO4) + H2O
Type: Spray , Spray , Spray
gate
glass
SiNXSiH4NH3,
n+ a-Si:HSiH4PH3
PECVD
a-Si:H
(2) a-SiNx:Hi. ii.
(3) n+ a-Si
---
---
glass
--- CleaningPT
SD LayerMO
GT Exposal Develop
glass
glass
Active Etch-Dry Etch
---SD
glass
Ashing
glass
glass
glass
1. Pre Dep. Clean
4Mask-PVX process
glass
3. VIA Mask
VIA Hole Wet Strip
1. Pre Dep. Clean
4Mask-ITO process
glass
Glass
Pixel
Data
QA/OQA
DGL