A DEFECTIVITY STUDY ON DRY DEVELOPMENT RINSE PROCESS

(DDRP)

Maastricht, The Netherlands - October 5-7, 2015 – EUVL International Symposium

Harold Stokes1, Yan Thouroude1, Lucia D’Urzo2, Safak Sayan3, Philippe Foubert4, Danilo De Simone4

1) SCREEN SPE GmbH, Mundelheimer Weg 39, 40472 Dusseldorf, Germany

2) Entegris GmbH, Hugo-Junkers-Ring 5, Gebäude 107/W, 01109, Dresden, Germany

3) Intel Corp. Assignee at IMEC, Kapeldreef 75, 3001 Leuven, Belgium

4) Imec, Kapeldreef 75, 3001 Leuven, Belgium

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© IMEC 2015

OUTLINE

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

• Dry Development Rinse Process (DDRP) introduction for EUVL

• Concept and key benefits

• First Dry Development Rinse Material (DDRM) patterning images on

NXE3300

• DDRM Defectivity: Pathfinding work for EUV

• Defectivity and Coating Uniformity on blanket 300mm wafers: setup &

optimization on SOKUDO DUO track

• Learning on DDRM LS pattern reversal defectivity using 193i

lithography as patterning vehicle.

• Summary and Outlook

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© IMEC 2015

DRY DEVELOPMENT RINSE PROCESS BY

NISSAN CHEMICAL - CONCEPT

Peculiarity: Pattern reversal process

Strengths: Line collapse reduction, etch resistance improvement

exposure post-expo-bake

developer

puddle

dry dev. rinse

(developer replacement)

spin dry and bake dry etch resist stripping

resist

same development cup unit

1 2 3 4

5 6 7

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

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© IMEC 2015

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

NXE3100 - DIP60X EL%

Resist DDRM

LWR = 3.4nm LWR = 3.7nm

Pattern reversal process Resolution improvement

KEY BENEFITS FROM DDRP

Exposures on NXE3100

[1] S. Sayan et al. Proc. of SPIE Vol. 9425 942516-1 2015

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© IMEC 2015

NXE3300 – RESIST PROCESS VS DDR PROCESS

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

Half Pitch = 13 nm

Resist-C 50nm FT

Associated

DDRP

Resolution Improvement: Pattern collapse mitigated by application of DDRM

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© IMEC 2015

OUTLINE

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

• Dry Development Rinse Process introduction for EUVL

• Concept and key Benefits

• First DDRM patterning images on NXE3300

• DDRM Defectivity:

• Pathfinding work for EUV to investigate Defectivity and Coating

Uniformity: setup & optimization on SOKUDO DUO 300mm track

• Learning on DDRM LS pattern reversal defectivity using 193i

lithography as patterning vehicle.

• Summary and Outlook

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© IMEC 2015

PROCESS SETUP

Entegris customized surface modified UPE membranes

NCR43

R3: improved solubility in DIW,

enhanced shelf life

Water based solvent

KLA eDR-7100® KLA-Tencor SP3® and 2835®

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

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© IMEC 2015

DDRM DEFECT COUNTS INDEPENDENT

FROM RUN ORDER

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

0.9

1

0 1 2 3 4 5 6 7 8

No

rma

lize

d D

efe

ct

Co

un

t

Wafer Run Order

>> 3s

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© IMEC 2015

DDRM DEFECT PERFORMANCE NOT

DEPENDENT ON DISPENSE VOLUME

Run T1/T2 Dispense

Volume

Normalized

Defect

Counts

1 2 2X 1.0

2 2 4X 0.4

3 1 3X 0.5

4 2 X .05

5 1 4X .05

6 1 X .05

7 2 3X .04

8 1 2X .05

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

0.9

1

X 2X 3X 4X

No

rma

lize

d D

efe

ct

Co

un

t Dispense Volume/wafer (mL)

Test 1

Test 2

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© IMEC 2015

DDRM COATING UNIFORMITY TESTING

• Range best for lowest dispense volume

• Lowest volume used for all subsequent testing

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

0.0

0.5

1.0

1.5

2.0

2.5

3.0

No

rma

lize

d 3

sig

ma

Dispense volume for Test 1 / Test 2

Test 1

Test 2

X 2X 3X 4X 0.0

0.5

1.0

1.5

2.0

2.5

3.0

No

rma

lize

d R

an

ge

Dispense volume for Test 1 / Test 2

Test 1

Test 2

X 2X 3X 4X

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© IMEC 2015

DEFECT OPTIMIZATION PATH -1

0.0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

0.9

1.0

Baseline A B C D E F

Rela

tive D

efe

ct

Co

un

ts 99% defect reduction

from: • Dispense method

• Optimal filter

• Surface preparation

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

Driving down defects on bare silicon wafers

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© IMEC 2015

DEFECT OPTIMIZATION PATH -2

0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

0.9

1

Baseline D E F

Rela

tive

Defe

ct

Co

un

ts

Class 1

Class 2

Class 3

Class 4

Class 5

0

0.002

0.004

0.006

0.008

0.01

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

Driving down defects on bare silicon wafers

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© IMEC 2015

OUTLINE

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

• Dry Development Rinse Process introduction for EUVL

• Concept and key Benefits

• First DDRM patterning images on NXE3300

• DDRM Defectivity:

• Pathfinding work pro EUV to investigate Defectivity and Coating

Uniformity: setup & optimization on SOKUDO DUO 300mm track

• Learning on DDRM LS pattern reversal defectivity using 193i

lithography as patterning vehicle.

• Summary and Outlook

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© IMEC 2015

PROGRAM DEFECT TRANSFER FROM RESIST TO DDRM

Defect on resist Defect on DDRM

Gap patterning area

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

Bridge patterning area Defect on resist Defect on DDRM

Program defect inspection demonstrates defect pattern reversal (Ex. Bridge Gap, Gap

Bridge)

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© IMEC 2015

Resist Pattern Defect count for each class Total

(DoI) Top Bottom Bridge Gap Block

PR-D Resist 21 7 3 0 0 31

DDRM 13 15 2 6 2 38

Top Bottom Bridge Block Gap

DEFECT CLASSIFICATION RESULTS

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

• DDRM and Resist have comparable total DoI

Defect

samples

Defects of Interest (DoI) on target wafer area

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© IMEC 2015

SUMMARY AND OUTLOOK

Demonstrated defect reduction Unpatterned substrate in preparation for optimal process

performance

Initial understanding of patterned DDRM defects based on

classification

Extend DDRM defect studies to NXE3300 EUV system Utilize similarities to reduce EUV pattern defects

Demonstrate DDRM process capable of being transferred to HVM

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

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© IMEC 2015

ACKNOWLEDGEMENTS

MAASTRICHT, THE NETHERLANDS - OCTOBER 5-7, 2015 – EUVL INTERNATIONAL SYMPOSIUM

Ryuji Onishi - Nissan Chemical assignee at IMEC

Naomi Inoue - Nihon Entegris KK, Liquid Micro-contamination Control

Applications Development