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Transcript of Supplementary Information Photocatalytic generation of ... · Photocatalytic generation of hydrogen...
1
Supplementary Information
Photocatalytic generation of hydrogen by core-shell WO3/BiVO4
nanorods with ultimate water splitting efficiency
Yuriy Pihosh,1, §, * Ivan Turkevych,2, 4, § Kazuma Mawatari,1 Jin Uemura,1 Yutaka Kazoe,1 Sonya Kosar,1, 3
Kikuo Makita,2 Takeyoshi Sugaya,2 Takuya Matsui,2 Daisuke Fujita,4 Masahiro Tosa,4 Michio Kondo,2 and
Takehiko Kitamori1,*
1Department of Applied Chemistry, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo,
Tokyo 113-8656, Japan
2National Institute of Advanced Industrial Science and Technology (AIST), AIST Central 2-13, Tsukuba, Ibaraki
305-0047, Japan
3Chernivtsy National University, Institute of Physics, Engineering and Computer Science, Storozhynetska 101,
Chernivtsy, 58000 Ukraine
4National Institute for Materials Science (NIMS), 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
----------------------------------------------------------------------------------------------------------------------------------------------------
* Corresponding authors email ([email protected]; [email protected]) § These authors contributed equally.
2
Fabrication of WO3-NRs/BiVO4+CoPi heterojunction photoanodes. At first, we deposited a compact
ITO film with the thickness of about 150 nm on fused silica substrates (5x5cm) at normal incidence angle (α=0º)
from the ITO target (99.999%, Furuchi Chem. Co.) in the Ar:O2 (15:0.3 SCCM) mixture and working pressure
of 0.6 Pa. Then, the stage was turned toward the Pt target (99.999%, Furuchi Chem. Co.) to deposit a thin Pt film
(~50 nm) in Ar atmosphere at the working pressure of 2 Pa. In the next step, the Pt film was encapsulated by the
deposition of the second ITO layer (150 nm), as described above. The ITO/Pt/ITO stack has a low sheet
resistance of ~3-4 Ω/☐ due to the encapsulated Pt layer, which simultaneously acts as a back reflector. Since the
Pt layer was encapsulated and had no contact with the electrolyte, it did not participate in the electrochemical
reaction and thus in future could be substituted by a less expensive metal, such as Ag or Al. After the deposition
of the ITO/Pt/ITO stack we set the sample over the third magnetron with W target (99.99%, Advantec Co.) and
changed the stage position to the GLAD regime with α=85º to the substrate normal. The WO3-NRs were
deposited in the GLAD regime by reactive sputtering in the O2:Ar (9.6 : 11 SCCM) mixture and low working
pressure of 0.3 Pa with the constant speed of substrate rotation of 45 rpm. The fabrication of WO3-NRs was
finalized by annealing in air at 575 °C for 4.5 h.
The precursor solution for the electrodepositon of BiVO4 was prepared by dissolving 10 mM of Bi(NO3)3 in
a solution of 35 mM VOSO4 adjusted to pH = 0.5 with HNO3. The Bi(III) is soluble at pH < 2, however no film
can be formed in such acidic solution. Therefore, at first the pH of the electrolyte was raised to 5.1 by 2 M
sodium acetate solution and then stabilized at pH = 4.7 by adding a few drops of concentrated HNO3, since
V(IV) starts to precipitate at pH > 5.
The electrodeposition of BiVO4 was conducted at potentiostatic conditions in the two electrode
configuration with the bias of 0.21 V applied between ITO/Pt/ITO/WO3-NRs as a working electrode and a Pt
mesh as a counter electrode. The deposition of amorphous BiVO4 was carried out at 55 °C by varying the
deposition time from 35 to 270 s. All freshly prepared samples were rinsed with distilled water, dried in the N2
steam and then annealed in air at 500 °C for 2 hours to convert the amorphous layer into a crystalline monoclinic
BiVO4.
The Co-Pi OER co-catalyst was deposited on the surface of BiVO4 from a solution of 0.15 M cobalt nitrate
in 0.1 M potassium phosphate buffer by a photo-assisted electrodeposition under 1 sun AM1.5G illumination.
The sample was biased vs a counter Pt mesh electrode at galvanostatic conditions to keep the photocurrent at
~10 μA cm-2. The optimized deposition time was found to be 500 s. The resulting photoanodes were rinsed with
distilled water and dried under a gentle N2 flow. The photoanodes based on flat film WO3/BiVO4 heterojunction
were prepared by using the same fabrication procedure, but without the GLAD regime. All chemicals were
purchased from Wako.
The photoelectrochemical (PEC) characterizations of the photoanodes were conducted according to the
standard PEC characterization protocol in a potassium phosphate buffer solution (pH=7) by using
ALS/CHI (608D) potentiostat and a standard three-electrode method with a Pt counter electrode and an Ag/AgCl
3
reference electrode. Two electrode measurements were conducted by following the same protocol. The I-V
characteristics and the photocurrent-time (Jp-t) profiles were recorded under simulated solar light provided by a
solar simulator (PEC-L01, Peccel Co.). The light intensity was adjusted by using an NREL calibrated
photodetector.
The VRHE potential was calculated by using the Nernst equation:
𝑉𝑅𝑅𝑅 = 𝑉𝐴𝐴/𝐴𝐴𝐴𝐴 + 0.059 ∗ 𝑝𝑝 + 𝑉𝐴𝐴/𝐴𝐴𝐴𝐴0 ,
where 𝑉𝑅𝑅𝑅 is the converted potential vs RHE, 𝑉𝐴𝐴/𝐴𝐴𝐴𝐴 is the experimental potential measured against the
Ag/AgCl reference electrode, and 𝑉𝐴𝐴/𝐴𝐴𝐴𝐴0 is the standard potential of Ag/AgCl at 25° C (0.198 V).
The incident photon to current conversion efficiency (IPCE) was measured in the two-electrode
configuration at the constant bias of 1V vs Pt electrode from 300 to 650 nm by using a tunable light source
provided by a stabilized 500 W Xenon lamp combined with a computer-controlled double grating
monochromator. The whole system was purchased from JASCO Co.
The oxygen and hydrogen evolution were directly measured in an airtight 2-electrodes PEC cell connected
to a gas micro-chromatograph (Inficon 3000, EZ IQ). Prior to measurements, the PEC cell was evacuated and
filled with Ar to atmospheric pressure repeatedly to eliminate air in the cell. The photoelectrode was biased at
1V vs the Pt counter electrode in pH 7 potassium phosphate buffer solution and illuminated by a simulated
AM1.5 solar light. The gas probes were taken every 10 minutes by the gas micro-chromatograph.
Physical characterization. X-Ray Diffraction (XRD) measurements were performed by using Rigaku
RINT-2500 XRD analyzer. The morphology of the samples was observed in Scanning Electron Microscope
(SEM) JEOL JSM-7001J equipped with the EDS probe, which was used to analyze the elemental composition
profiles. Scanning Probe Microscopy (SPM) analyses were performed in a semi-contact mode with a silicon
cantilever for topography measurements. In order to spread resistance measurements, the ITO film underlying
the nanorods was electrically biased at -2.0 V, whereas the conductive cantilevers (BudgetSewnsors, ContE-G,
Cr/Pt, spring constant k=0.22 N/m, tip radius 25 nm or Multi75E-G, Cr/Pt, k=2.4 N/m, tip radius 25 nm) were
grounded.
4
Supplementary Figures
Supplementary Figure S1. Top and cross section SEM images of optimized WO3-NRs (a, b) and core-shell
WO3-NRs/BiVO4 nanostructures (c, d).
Supplementary Figure S2. Optimization of the WO3-NRs/BiVO4 photoanode. (a) Photocurrents measured at
1.23VRHE under the standard AM1.5 illumination vs total charge density that passed during the
electrodeposition of BiVO4 for WO3-NRs/BiVO4 samples (blue) together with photocurrent values for initial
WO3-NRs (green) and optimized WO3-NRs/BiVO4+CoPi (red) samples. SEM images of initial WO3-NRs
prepared by GLAD (b) and after electrodeposition of BiVO4 (c-i).
1 μm
1 μm
1 μm
1 μm
WO3-NRs
ITOPt
WO3-NRs/BiVO4
(a) (b)
(c) (d)
ITOPt
100 nm
100 nm
0.0 0.4 0.5 0.6 0.7 0.8
1
2
3
4
5
6
7
Phot
ocur
rent
, Jp (
mA
cm-2)
Total charge density (C cm-2)
WO3-NRs
WO3-NRs/BiVO4
WO3-NRs/BiVO4 +CoPi(a)
(b)
(c)
(d)
(c)(d)
(e)
(b) WO3-NRs
(f)(g)
(h)(i)
500nm
500nm
500nm (f)(e)500nm 500nm (g)
(h)
(i)
500nm
500nm
500nm
5
Supplementary Figure S3. SPM characterization of WO3-NRs and WO3-NRs/BiVO4 samples: (a, c)
topographies, (b, d) local current maps and (c, f, g) I-V characteristics measured at selected points.
Supplementary Figure S4. (a) SEM image of a single WO3 nanorod with a BiVO4 conformal layer and (b) W,
Bi and V elemental distributions across the nanorod measured by EDS.
-2 -1 0 1 2
-0.1
0.0
0.1
-1
0
1
-20
0
20
#2 #4 #6 #8
Curre
nt (n
A)
Voltage (V)
#1 #3 #5 #7
Curre
nt (n
A)
#1 #2 #3
Curre
nt (n
A)
WO3-NRs
WO3-NRs/BiVO4
(a) (b)WO3-NRs
(c) (d)
WO3-NRs/BiVO4(layer)
WO3-NRs/BiVO4(clusters)
(e)
(f)
(g)
0 200 400 600 800 1000 1200
Distance[nm]
200nm
W
Bi
V
(a)
(b)
6
Supplementary Figure S5. XRD spectra of (a) WO3-NRs/BiVO4, (b) WO3-NRs, and (c) ITO/Pt/ITO samples.
20 25 30 35 40
2Theta (degree)
Inte
nsity
(a.u
.)
BiVO4 WO3 ITO + Pt
(a)
(b)
(c)
7
Supplementary Figure S6. I-V characteristics of the optimized WO3-NRs (green), WO3-NRs/BiVO4 (blue) and
WO3-NRs/BiVO4+CoPi (red) samples measured in a three-electrode configuration.
Supplementary Figure S7. Comparison of I-V characteristics of the same optimized WO3-NRs/BiVO4+CoPi
photoanode measured by two-electrode (red) and three-electrode (blue) methods.
0.2 0.4 0.6 0.8 1.0 1.2 1.4 1.6 1.8 2.0 2.20
1
2
3
4
5
6
7
8
Phot
ocur
rent
, Jp (
mA
cm-2)
Potential, VRHE (V)
WO3-NRs/BiVO4+CoPi
WO3-NRs/BiVO4
WO3-NRsDark
1.23VRHE
0.0 0.5 1.0 1.5 2.00
1
2
3
4
5
6
7
80.0 0.5 1.0 1.5 2.0
Potential (V)
Phot
ocur
rent
, Jp (m
A cm
-2)
Potential (VRHE)
3 electrode method
2 electrode method
Dark
1.23VRHE
8
Supplementary Figure S8. Combined effect of light concentration and elevated temperature on the performance
of an optimized WO3-NRs/BiVO4 and WO3-NRs/BiVO4+CoPi photoanodes. (a) Dependence of the photocurrent
on light intensity measured at different temperatures (25 – 50 oC) under 1V bias vs Pt counter electrode. The
dashed line shows a theoretical photocurrent of 6.7 [mA]×Im [suns] with the intensity exponent m = 1, i.e.
without additional recombination losses. (b) The intensity exponent m calculated from experimental data for
WO3-NRs/BiVO4+CoPi photoanode by a linear fit of log-log plot of the photocurrent vs light intensity,
Lg(Jp) ~ m×Lg(I). (c) Dependence of the photocurrent on light intensity at different temperatures (25 – 50 oC)
under 1V bias vs Pt counter electrode measured in the electrolyte containing 0.5M H2O2 as the hole scavenger.
(d) Separation (Psep) and injection (Pinj) efficiencies vs light intensity for different temperatures calculated for the
potential 1V vs Pt counter electrode. The absorption efficiency was assumed to be 100% with the absorption
photocurrent JA = 7.5 mA cm-2.
20 25 30 35 40 45 50 550.5
0.6
0.7
0.8
0.9
1.0
Inten
sity e
xpon
ent
Temperature (oC)
0.5 1.0 1.5 2.0 2.5 3.0 3.52468
101214161820
WO3-NRs/BiVO4
WO3-NRs/BiVO4+CoPi
25 oC
50 oC
50 oC
30 oC35 oC40 oC45 oC
Phot
ocur
rent
, Jp (m
A cm
-2)
Light concentration (suns)
25 oC
(a)
(b)
0.5 1.0 1.5 2.0 2.5 3.0 3.52468
101214161820
WO3-NRs/BiVO4
25 oC 50 oC
WO3-NRs/BiVO4+CoPi 25 oC 50 oC
Phot
ocur
rent
, Jp (m
A cm
-2)
Light concentration (suns)
(c)
0.5 1.0 1.5 2.0 2.5 3.0 3.520
40
60
80
100
25oC, 50oC WO3-NRs/BiVO4
25oC, 50oC WO3-NRs/BiVO4+CoPi
25oC, 50oC WO3-NRs/BiVO4+CoPi25oC, 50oC WO3-NRs/BiVO4
P sep, P
inj ef
ficien
cy (%
)
Light concentration (suns)
(d)
Psep
Pinj
H2O(buffer)
H2O + H2O2(buffer)
9
Supplementary Figure S9. Demonstration of the PEC cell heating to 50-60 oC by concentrated solar light.
Supplementary Figure S10. Schematic illustration of the GaAs/InGaAsP double-junction PV cell structure and
assembly of the PEC-PV tandem cell. (a) and (b) show IPCE spectra of the PV cell and the PEC-PV tandem,
respectively. (c) I-V characteristics of the PV cell measured under normal incident light at 1 sun (red), and in
parallel to the incident light in the tandem assembly without the photoanode at 1 sun (blue), at 3 suns (green) and
at dark conditions (black).
0 20 40 60 80 100 12020
30
40
50
60
Cell t
empe
ratu
re (0 C)
Time (min)
Thermocouple
Photoanode Pt
Concentratedsolar light
Under 3 suns illumination
PV cell structure
400 600 800 1000 1200 1400
0
20
40
60
80
100
IPCE
(%)
Wavelenght (nm)
(b)
PV(top cell)
PV(bottom cell)
PEC
PEC-PV tandem
400 600 800 1000 1200 1400
0
20
40
60
80
100
IPCE
(%)
Wavelenght [nm]
(a)
PV(top cell)
PV(bottom cell)
PV cell
-0.5 0.0 0.5 1.0 1.510-5
10-4
10-3
10-2
10-1
100
101
102
Abso
lute
cur
rent
den
sity
(mA
cm-2)
Voltage (V)
dark
⊥, 1 sun Jsc=12.11 mAcm-2
Voc = 1.33V
(c)
, 3 sun
, 1 sun
GaAs(top cell, Eg = 1.42 eV)
InP(substrate)
Top grid
Back contact
InGaAsP(botom cell, Eg = 1.0 eV)
Pd Pd
H2O
O2
45o H2
H2O
Jp
PEC-PV tandem
Pt
10
Supplementary Figure S11. Photograph of the assembled PEC-PV tandem cell.
Supplementary Figure S12. Schematic illustration of a possible water splitting panel with O2 and H2 collecting
tranches that are fitted with PEC-PV tandems, Pt counter electrodes and hemispherical light concentrators on the
top of the panel module.
PV cell
Photoanode
Pt counter electrode
PV-PEC tandem
Micro-gap hydrophobic H2 / O2 separation channels
Contact
Pt PECPV O2H2
11
Supplementary Figure S13. I-V characteristics of the photoanodes based on core-shell WO3-NRs/BiVO4+CoPi
nanostructures (a) and WO3/BiVO4+CoPi flat films (b) measured at 90o and 45o with respect to the incident light.
(c,d) Cross section SEM images of the core-shell and flat film photoanodes, respectively.
0.0 0.2 0.4 0.6 0.8 1.0 1.20
2
4
6
8
Phot
ocur
rent
, Jp (m
A cm
-2)
Potential (V)
at 90o
at 45o
0.0 0.2 0.4 0.6 0.8 1.0 1.20
2
4
6
8
Ph
otoc
urre
nt, J
p (m
A cm
-2)
Potential (V)
at 90o
at 45o
WO3-NRs/BiVO4+CoPi WO3-flat film/BiVO4+CoPi (a) (b)
1 μm
(c)
ITOPt
Core-shell WO3-NRs/BiVO4+CoPi
1 μm
WO3- flat film
BiVO4+CoPi - flat film
(d)
ITOPt
12
Supplementary Figure S14. I-V characteristics of the photoanodes based on core-shell WO3-NRs/BiVO4+CoPi
nanostructures measured under concentrated light of 3 suns in the standard electrolyte and with hole scavenger
0.5M H2O2, and calculated Psep and Pinj efficiencies at 25 oC (a,c) and 50 oC (b,d), respectively. The absorption
efficiency was assumed to be 100% with the absorption photocurrent JA = 7.5 mA cm-2.
0.0 0.2 0.4 0.6 0.8 1.0 1.202468
10121416182022
Pho
tocu
rrent
, Jp (m
A cm
-2)
Potential (V)
3 Suns, 25oC H2O+ H2O2 (buffer) H2O (buffer)
0.0 0.2 0.4 0.6 0.8 1.0 1.202468
10121416182022
Pho
tocu
rrent
, Jp (m
A cm
-2)
Potential (V)
3 Suns, 50oC H2O+H2O2 (buffer) H2O (buffer)
0.0 0.2 0.4 0.6 0.8 1.0 1.20
20
40
60
80
100
P sep,
P inj e
fficie
ncy
(%)
Potential (V)
3 Suns, 25 oC Psep
Pinj
0.0 0.2 0.4 0.6 0.8 1.0 1.20
20
40
60
80
100
P sep,
P inj e
fficie
ncy
(%)
Potential (V)
3 Suns, 50oC Psep, Pinj
(a) (b)
(c) (d)