MHI#10 号機の 1 回目の EP2 Process log Status of working Monitor data during EP & Rinsing...

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MHI#10 号号号 1 号号号 EP2 Process log Status of working Monitor data during EP & Rinsing process d : 2010/5/11 5/17 ss : CP @flanges, EP2(20μm) under low current density, Degreasing(F HPR x 2, Assembly in C.R., Vacuum evacuation, Leak check, Baking @100℃ (48hours) ration : Washing vacuum components with ultrasonic, Cleaning in C.R rs : M. Sawabe, Kirk, M. Satoh (KEK), K. Nakamura, N. Tasaki, F. Tsukada (Assist Engineering Co.), T. Okada, M. Iitake (K-VAC), M. Asano, S. Imada, T. Yanagimachi (Nihon Advanced Technology) Kirk 1 STF Cavity Group Meeting @2010/5/17

Transcript of MHI#10 号機の 1 回目の EP2 Process log Status of working Monitor data during EP & Rinsing...

Page 1: MHI#10 号機の 1 回目の EP2  Process log  Status of working  Monitor data during EP & Rinsing process Period : 2010/5/11 ~ 5/17 Process : CP @flanges, EP2(20μm)

MHI#10号機の1 回目のEP2

Process log Status of working Monitor data during EP & Rinsing process

Period : 2010/5/11 ~ 5/17Process : CP @flanges, EP2(20μm) under low current density, Degreasing(FM-20),

HPR x 2, Assembly in C.R., Vacuum evacuation,Leak check, Baking @100℃ (48hours)

Preparation : Washing vacuum components with ultrasonic, Cleaning in C.R.Workers : M. Sawabe, Kirk, M. Satoh (KEK),

K. Nakamura, N. Tasaki, F. Tsukada (Assist Engineering Co.),T. Okada, M. Iitake (K-VAC),M. Asano, S. Imada, T. Yanagimachi (Nihon Advanced Technology)

Kirk1

STF Cavity Group Meeting @2010/5/17

Page 2: MHI#10 号機の 1 回目の EP2  Process log  Status of working  Monitor data during EP & Rinsing process Period : 2010/5/11 ~ 5/17 Process : CP @flanges, EP2(20μm)

Process log ①

STF Cavity Group Meeting @2010/5/17

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5/11 10:05~ CP @flanges (No crack at every flange)10:45~ Attachment of jigs for EP11:40 Set cavity to EP bed with crane13:08 Installation of cathode bar to cavity13:27 Meeting for tomorrow’s working procedure13:41 Pressure test with N2 gas

Set data logger to cavity13:30~ Vacuum parts rinsing with ultrasonic in C.R.

5/12 9:00 Working starts10:05 EP2 starts11:17 EP2 stops [1h12m34s] / Idling rotation (3 rpm)11:37 Idling rotation stops11:38 EP acid is removed from cavity (0.023MPa)12:02 First rinsing with ultra pure water starts (0.025MPa)13:36 First rinsing with ultra pure water stops13:43 Detachment of restriction jigs / Data logger detached / adjusting degreaser(FM-20)13:55 Un-installation of cathode bar from cavity / washing cathode bar14:12 transferring cavity from EP bed to wagon / Checking inside cavity (No marks)

/ Smelling sulfur a little14:15 Detachment of jigs for EP14:37 Detaching every blind flanges14:38 Shower rinsing starts in CP room14:47 Shower rinsing stops / Checking inside cavity (No marks)

Page 3: MHI#10 号機の 1 回目の EP2  Process log  Status of working  Monitor data during EP & Rinsing process Period : 2010/5/11 ~ 5/17 Process : CP @flanges, EP2(20μm)

Process log ②

STF Cavity Group Meeting @2010/5/17

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5/12 14:50 Attachment of jigs for degreasing15:00 Flowing FM-20 into cavity15:05 Degreasing with ultrasonic starts17:05 Degreasing with ultrasonic stops17:08 Removing FM-20 from cavity17:20 Detachment of jigs for degreasing17:22 Shower rinsing starts in CP room17:29 Shower rinsing stops / Checking inside cavity (No marks)17:42 Transferring cavity from wagon on turntable for HPR using crane17:45 Checking tolerance between position of nozzle and center of beam pipe17:49 Checking HPR machine by rinsing inside cavity in only one stroke17:59 HPR for outside cavity starts18:31 1st HPR for inside cavity starts23:49 1st HPR for inside cavity stops [5h18m] (6 turns)23:53 fin.

Page 4: MHI#10 号機の 1 回目の EP2  Process log  Status of working  Monitor data during EP & Rinsing process Period : 2010/5/11 ~ 5/17 Process : CP @flanges, EP2(20μm)

Process log ③

STF Cavity Group Meeting @2010/5/17

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5/13 9:00 Attachment of blind flanges at every port for 2nd HPR 9:40 2nd HPR for inside cavity with blind flanges starts14:04 2nd HPR for inside cavity with blind flanges stops [5h24m] (6 turns)14:10 Cavity enters into C.R.

Preparation for attachment of Pirani gauge to pumping systemSlow leak / Shutdown pumping system / Attachment of Pirani gauge

Restarts pumping system (rotary pumps stops several times)Exchange for the other pumping system [O.K.]

14:30 Assembly in C.R. (Class 10) starts16:50 Assembly in C.R. (Class 10) stops17:00 Vacuum evacuation starts17:30 Leak check (small leak from vacuum pipe) [O.K.]18:00 Baking @100℃ starts19:44 Cavity vacuum : 5.5 x 10-4Pa @104 ℃ /93℃

5/14 18:35 Cavity vacuum : 5.39 x 10-5Pa @105 ℃ /102℃

5/15 22:42 Cavity vacuum : 3.61 x 10-5Pa @106 ℃ /99℃Baking Off / Ion Pump ON [48hours baking] / Vacuum not so good

23:01 Cavity vacuum : 3.76 x 10-5Pa @92 ℃ /77℃

5/16 22:45 Cavity vacuum : 2.96 x 10-5Pa / I.P head : 7.2 x 10-7Pa22:48 Check pumping system in C.R.23:04 2.07 x 10-5Pa@ULVAC, 3.37 x 10-5Pa@ANELVA, 1.2 x [email protected].

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Process log ④

STF Cavity Group Meeting @2010/5/17

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5/17 1:05 0.91 x 10-5Pa@ULVAC, 2.92 x 10-5Pa@ANELVA, 7.7 x [email protected]. 8:59 Check pumping system in C.R.

Leak check for every vacuum components [O.K.]Leak check cavity flange [O.K.]Leak check by hood method [O.K.]Leak check environment around cavity [O.K.]

5.5 x [email protected] leak!

10:02 Turbo I.P.13:54 8.98 x 10-6Pa@ULVAC, 2.94 x 10-5Pa@ANELVA, 8.3 x [email protected].

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Status of working ①

STF Cavity Group Meeting @2010/5/17

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Page 7: MHI#10 号機の 1 回目の EP2  Process log  Status of working  Monitor data during EP & Rinsing process Period : 2010/5/11 ~ 5/17 Process : CP @flanges, EP2(20μm)

Status of working ②

STF Cavity Group Meeting @2010/5/17

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Status of working ③

STF Cavity Group Meeting @2010/5/17

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Page 9: MHI#10 号機の 1 回目の EP2  Process log  Status of working  Monitor data during EP & Rinsing process Period : 2010/5/11 ~ 5/17 Process : CP @flanges, EP2(20μm)

STF Cavity Group Meeting @2010/5/17

Status of 1st EP2 for MHI#10 ①

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current

voltage

Tcavity

Treservoir

Troom

Tcavity

average current density平均電流密度が 30mA/cm2程度になるように電圧を調整する。(low current density EP)さらに、窒素ガスを流している。

Page 10: MHI#10 号機の 1 回目の EP2  Process log  Status of working  Monitor data during EP & Rinsing process Period : 2010/5/11 ~ 5/17 Process : CP @flanges, EP2(20μm)

Status of 1st EP2 for MHI#10 ②

STF Cavity Group Meeting @2010/5/17

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左図は平均電流密度と電圧の相関右図は定常状態での分布

target

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Status of 1st EP2 for MHI#10 ③

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#1 #2 #3 #4 #5 #6 #7 #8 #9 #10

EP2の間の空洞温度の状況。

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Status of 1st EP2 for MHI#10 ④

STF Cavity Group Meeting @2010/5/17

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#1 #2 #3 #4 #5 #6 #7 #8 #9 #10

一次洗浄中の空洞温度の状況。超純水導入後に、空洞下部から温度上昇が起こっているのがわかる。

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Status of 1st EP2 for MHI#10 ⑤

STF Cavity Group Meeting @2010/5/17

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#1 #2 #3 #4 #5 #6 #7 #8 #9 #10

一次洗浄中の空洞温度の状況。(前ページの拡大図)空洞下部からの温度上昇のタイミングは各セル間で微妙にずれており、水が徐々に溜っていくことを示している。

Page 14: MHI#10 号機の 1 回目の EP2  Process log  Status of working  Monitor data during EP & Rinsing process Period : 2010/5/11 ~ 5/17 Process : CP @flanges, EP2(20μm)

STF Cavity Group Meeting @2010/5/17

Status of HPR for MHI#10

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ノズルは 1st HPRでは6往復、 2nd HPRでは5往復させた。

Particleが over-rangeしている

1 往復目の TOCはうまく測れていないみたい

蓋付き HPRではいずれも激減している

Page 15: MHI#10 号機の 1 回目の EP2  Process log  Status of working  Monitor data during EP & Rinsing process Period : 2010/5/11 ~ 5/17 Process : CP @flanges, EP2(20μm)

今回の処理で変更したところ• Degreasing (FM-20)を2時間にした。

degreasing後のシャワー洗浄を入念に行った。

• 温水超音波洗浄をスキップした。• HPR室の雰囲気を良くするために、事前に空放水を行った。

おかげで、 TOCの振る舞いは以前のような正常なものに戻った。

• いつも使用している空洞排気系が故障したため、急きょお隣の排気系で代用した。

イオンポンプの引きがすごく悪化している。ベーキング終了後、一日経過しても真空がなかなか下がらなかっ

た。

STF Cavity Group Meeting @2010/5/17

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低電流密度 ( ~ 30mA/cm2)EPや EP2及び一次洗浄中の窒素ガス導入などに変更無し!