MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin...

22
1 IEEE2011 L L ow ow ow ow ow ow ow ow Transmission Loss Transmission Loss Multi Multi - - layer Material layer Material for High for High - - Speed & High Speed & High - - Frequency Applications Frequency Applications MCL MCL - - FX FX - - 2 / FX 2 / FX - - 3 3 IEEE 2011, Nov 9th Hikari Hikari Murai Murai , , Yasuyuki Yasuyuki Mizuno Mizuno , Hiroshi Shimizu, , Hiroshi Shimizu, Takahiro Tanabe, Ken Ikeda and Takahiro Tanabe, Ken Ikeda and Tetsuro Tetsuro Irino Irino Telecommunication Materials Development center Tsukuba Research Laboratory Printed Wiring Board Material R&D Dept. Printed Wiring Board Materials Business Sector

Transcript of MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin...

Page 1: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

1

IEEE2011

LLowowowowowowowow Transmission LossTransmission Loss MultiMulti--layer Material layer Material

for Highfor High--Speed & HighSpeed & High--Frequency ApplicationsFrequency Applications

MCLMCL--FXFX--2 / FX2 / FX--33

IEEE 2011, Nov 9th

HikariHikari MuraiMurai, , YasuyukiYasuyuki MizunoMizuno, Hiroshi Shimizu, , Hiroshi Shimizu,

Takahiro Tanabe, Ken Ikeda andTakahiro Tanabe, Ken Ikeda and TetsuroTetsuro IrinoIrino

Telecommunication Materials Development center

Tsukuba Research Laboratory

Printed Wiring Board Material R&D Dept.

Printed Wiring Board Materials Business Sector

Page 2: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

2

IEEE2011

Roadmap of Infrastructure-Communication Network

Servers Transmission Rate: 1.5 Gbps⇒⇒⇒⇒3 Gbps Dk:4.0, Df:<0.010 Level

Routers 30Layers ⇒⇒⇒⇒ 40 Layers Lead-Free applicable

Narrow Pitch,

Symmetrical Packaging

Reflow Temp: 260 oC

Super Computers Transmission Rate: 5 Gbps⇒⇒⇒⇒10 Gbps Dk:3.5, Df:<0.005 Level

High-End Giga bit Router 30Layers ⇒⇒⇒⇒ 50 Layers Heat Resistance for Lead Free

Base Station:Back panel Reflow Temp: 260 oC

RF modules for Halogen Free Materials applied Dk:<3.7, Df:<0.007 Level

Mobile Handset Devices Frequency: 1.5 GHz ⇒⇒⇒⇒ 3 GHz High Thickness Accuracy

(PA, Filter ,etc) 4Layers ⇒⇒⇒⇒ 6Layers, Higher Density Laser drill process ability

Reflow Temp: 260 oC Heat Resistance(Lead Free)

Halogen Free requirement Halogen free material

Antenna of Base Station Frequency: 1.5 GHz ⇒⇒⇒⇒ 3 GHz Dk:<3.5, Df:<0.003 Level

Phase Shifters, From Teflon & PPE boards Lower Process Cost

Anti crash rader on to Lower Cost Materials Drift of electric property on

automotive and etc Frequency: 24 GHz ⇒⇒⇒⇒ 76 GHz water absorption

ApplicationRequired Properties of

Base Materials

General

High-

Frequency

Properties (Functions)Field

Page 3: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

3

IEEE2011

Teflon Grade

Df(1 GHz)

Dk(1 GHz)

0.0020

0.0040

0.0060

0.0080

0.0100

0.0120

0.0140

0.0160

0.0180

0.0200

0.0220

0.0240

0

4.4 4.3 4.2 4.1 4.0 3.9 3.8 3.7 3.6 3.5 3.4 3.3 3.2 3.1 3.0 2.9 2.8

Standard FR4

High Tg FR-4

Filled High Tg

※※※※ JPCA TM001/IPC TM650 2.5.5.5.1JPCA TM001/IPC TM650 2.5.5.5.1JPCA TM001/IPC TM650 2.5.5.5.1JPCA TM001/IPC TM650 2.5.5.5.1

Property map of high frequency materials

FX-3

HighHigh--End GradeEnd GradeDkDk 3.7 / 3.7 / DfDf 0.0070.007

JPCAJPCA--HCL01/21HCL01/21

IEC 61249IEC 61249--22--32/3432/34

MiddleMiddle--Range GradeRange GradeDkDk 4.1 / 4.1 / DfDf 0.0170.017

JPCAJPCA--HCL02/22HCL02/22

IEC 61249IEC 61249--22--31/3331/33

Fx-2

Page 4: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

4

IEEE2011

Requirement of Material for High-Frequency PWBs

Stripline

Propagation delay time Td =Dkc

Characteristic impedance Zo =

wtb

60

Dk

4b

0.67p(0.8w + t)In

Transmission loss( a ) = Conductor loss( ac ) + Dielectric loss( ad )

ad = 27.3 Dk Dff

c

Dk : dielectric constant, Df : Dissipation factor, f : Frequency, c : Light velocity

b : Dielectric layer thickness

w : Conductor widtht : Conductor thickness

Important issue in high-frequency circuits Reducing transmission loss

/ Reduction of ad Low Dk & Df Resin Technology(Excellent dielectric properties & Stable Dk &Df for the wide range of frequency, temperature, humidity, …..)

/ Reduction of ac Original Profile-Free Conductor(High adhesion technology for very low surface roughness foil)

< Solution for Requirement >

Page 5: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

5

IEEE2011

Low Dk & Low Df

Thermosetting resin system

(Low-polar cross-linking design)

Non-polar & Rigid

Liner polymer

Semi-IPN structure resinby Original polymer alloy technologyStable Dk & Df

vs. Temperature & Humidity Low Df Inorganic filler

Filler/Resin Interface Control

Low Dk / Low Df

Low water absorption

High Tg

High heat resistance

Low water absorption

Low Dk / Low Df

Good insulation reliabilityLow Df

Low CTE

Novel high performance materialNovel high performance material

< Structure model of cured new resin >< Structure model of cured new resin >

Non-polar & Rigid

Linear polymer

High heat resistance

Low Dk & Low Df

Thermosetting resin

High Tg & High strength

Hardener

Low Df Inorganic filler

Development Concept of New Resin System

Page 6: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

6

IEEE2011

General Properties of New Material

* IPC-TM-650 2.5.5.9: Capacitance method with RF Impedance/Material Analyzer (25 oC)

** JPCA-TM001 A test method for copper-clad laminates for printed wiring boards dielectric constanat and dissipation factor.

IPC-TM-650 2.5.5.5.1: Triplate-line resonator method with Network Analyzer (25 oC)

*** Moisture treatment condition: PCT (121oC/0.22 MPa)

**** TH/TH wall thickness: 0.3 mm, Condition: 85oC/85%RH, 100 V dc applied

Item Condition Unit FX-2PTFE/E-Glass

substrate

Conventional

FR-4

Dielectric Constant (Dk) 1 GHz* - 3.50 - 3.55 2.65 - 2.70 4.10 - 4.20

1 GHz** - 3.40 - 3.45 2.60 - 2.65 4.00 - 4.10

3 GHz** - 3.40 - 3.45 2.60 - 2.65 3.95 - 4.05

Dissipation factor (Df) 1 GHz* - 0.0014 - 0.0018 0.0005 - 0.0010 0.0160 - 0.0180

1 GHz** - 0.0024 - 0.0028 0.0024 - 0.0028 0.0180 - 0.0200

3 GHz** - 0.0034 - 0.0038 0.0030 - 0.0034 0.0200 - 0.0220

Copper peel strength (18 µm) Standard (Rz: 5-7 µm) 0.7 - 0.9 1.3 - 1.4 1.4 - 1.6

VLP (Rz: 3-4 µm) kN/m 0.6 - 0.7 - -

PF (Rz: 1 µm) 0.7 - 0.8 - -

Glass transition temperature (Tg) TMA oC 175 - 185 20 - 25 120 - 130

CTE xy 14 - 15 17 14 - 17

z1 ppm/oC 48 - 55 100 - 110 50 - 70

z2 100 - 130 290 - 320 240 - 310

Heat resistance (T-288) IPC-TM-650 2.4.24.1 min > 60 - < 3

Heat resistance PCT***-3 h - Good Good NG

(288 oC/20 s dipping) PCT***-5 h - Good Good NG

Water absorption PCT***-5 h % 0.20 - 0.30 0.01 - 0.02 1.0 - 1.2

CAF restraining property**** - h > 1000 - > 1000

Flammability UL-94 - V-0 V-0 V-0

Page 7: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

7

IEEE2011

< Measurement Conditions >

/ Method:Triplate-Line Resonator by Vector Network Analyzer/JPCA TM001/IPC-TM-650_2.5.5.5.1/ Temperature & Humidity: 25 oC / 60 %RH/ Laminate Thickness: 0.8 mm (Signal-Ground Distance: 0.8 mm), Copper foil:18 µm/ Signal Conductor Line Width: 1 mm

Dielectric Properties (vs. Frequency)

2.5

3.0

3.5

4.0

4.5

0 2 4 6 8 10

Frequency (GHz)

Dk

Conventional FR-4

FX-2

PTFE/E-glass

0

0.005

0.010

0.015

0.020

0.025

0 2 4 6 8 10

Frequency (GHz)

Df

Conventional FR-4

FX-2

PTFE/E-glass

Excellent stability of dielectric properties in wide frequency bands

Page 8: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

8

IEEE2011

0

0.002

0.004

0.006

0.008

0.010

0 5 10 15 20 25 30

Frequency (GHz)

Df

3.2

3.3

3.4

3.5

3.6

3.7

3.8

0 5 10 15 20 25 30

Frequency (GHz)

Dk

< Measurement Conditions >

/ Method:Triplate-Line Resonator by Vector Network Analyzer/JPCA TM001/IPC-TM-650_2.5.5.5.1/ Temperature & Humidity: 25 oC/ 60 %RH/ Laminate Thickness: 0.8 mm(Signal-Ground Distance: 0.8 mm), Copper foil:18 µm/ Signal Conductor Line Width: 1 mm

Dielectric Properties (vs. Frequency 1 to 30GHz)

FX-2

FX-2

Page 9: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

9

IEEE2011

1

2

3

4

5

6

7

8

1M 10M 100M 1G 10G

Freqency: Hz

E Glass(****)

Dk

Epoxy/Dicy Curing

PTFE

1M 10M 100M 1G 10G

Frequency: HzDf

****) Glass Fabric Data by suppler

Epoxy/Dicy Curing

E Glass(****)

0

0.01

0.02

0.03

0.04

PTFE

Low Dk Glass(****)

Low Dk Glass(****)

Resin / Glass Fabric Effect of Resin / Glass Fabric Effect of Resin / Glass Fabric Effect of Resin / Glass Fabric Effect of Dk/DfDk/DfDk/DfDk/DfResin / Glass Fabric Effect of Resin / Glass Fabric Effect of Resin / Glass Fabric Effect of Resin / Glass Fabric Effect of Dk/DfDk/DfDk/DfDk/Df

Page 10: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

10

IEEE2011

Dk & Df of new material

Relationship between Dk&Df and resin content of laminates

<<<< Measurement Conditions >>>>

/ Method::::Triplate-Line Resonator by Vector Network Analyzer (JPCA tm001/IPC-TM-650_2.5.5.5.1)/ Temperature & Humidity::::25 ℃℃℃℃/ 60 %RH/ Laminate Thickness::::1.6 mm (Signal/Ground: 800 μμμμm apart), Copper foil::::18 μμμμm/ Signal Conductor Line Width::::1 mm (Zo: ca. 50 ΩΩΩΩ)

2.8

3.0

3.2

3.4

3.6

3.8

4.0

4.2

4.4

50 55 60 65 70 75 80 85 90

Resin Content(vol%)

Dk(1GHz)

Current Low Dk

FX-2

Conventional FR-4

Low Dk Epoxy

Dk(1 GHz)

0

0.005

0.010

0.015

0.020

0.025

50 55 60 65 70 75 80 85 90

Resin Content(vol%)

Df(1GHz)

Current Low Dk

FX-2

Conventional FR-4

Low Dk Epoxy

Df(1 GHz)

Page 11: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

11

IEEE2011

Filler/Resin-Composite Technology(1)

Matrix resin

Aggregation

Inorganic

Filler

/ Increase in water absorption

/ Poor heat resistance

/ Poor electric insulation

and CAF restraining property

Interface Control between Filler and Resin (FICS)

Optimization of filler / resin-interface

High Dispersion & Excellent adhesion

/ Low water absorption

/ Excellent heat resistance

/ Excellent electric insulation

and CAF restraining property

Page 12: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

12

IEEE2011

Filler/Resin-Composite Technology(2)

0.0025

0.0030

0.0035

0.0040

0.0045

0.0050

0.30 0.35 0.40 0.45 0.50

Water Abshorption

(mass%,after PCT-5h)

Df(1GHz, after PCT-5h)

Df of the cured resin after PCT

Effect by Optimal Interface Control on Df of the Cured Resin

Untreated

Optimally treated

Excellent dispersion & adhesion

< Cross section of cured resin >

Filler

Water absorption (%, after PCT-5 h)

Df(1 GHz)

Page 13: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

13

IEEE2011

F value 363

F value 91.0

F value 221

F value 55.0

Conventional

Filler used

Smaller particle

filler used

Frequency GHz Frequency GHz

Frequency GHz Frequency GHz

Dk

Dk

Df

Df

Dk Standard Dev. of small filler is 22% lower than that of conventional

Df Standard Dev. of small filler is 18% lower than that of conventional

Dk, Df Deviation Analysis (- Filler size impact)

Page 14: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

14

IEEE2011

Dk standard Dev. Of 1078 is equivalent to that of 1080

Df Standard Dev. of 1078 is 24% lower than that of 1080

Conventional Glass

(#1080××××13plyRC:57.9%)

Spread out Glass

(#1078××××13plyRC:55.5%)

F value 244

F value 81.8

F value243

F value 46.9

Frequency GHz Frequency GHz

Frequency GHz Frequency GHz

Dk

Dk

Df

Df

Dk, Df Deviation Analysis

(- Fiber wave Impact: #1078 vs. #1080)

Page 15: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

15

IEEE2011

Copper RoughnessCopper Roughness

●●●●●●●● Surface shape of matt side by SEMSurface shape of matt side by SEMSurface shape of matt side by SEMSurface shape of matt side by SEM

5.0 µµµµm

Standard Rz : 6-8 µm VLP Rz : 3-4 µm Profile-free Rz : 0.5-1.5 µm

5.0 µµµµm 5.0 µµµµm

●●●●●●●● Surface shape of matt side by AFMSurface shape of matt side by AFMSurface shape of matt side by AFMSurface shape of matt side by AFM

Rz=0.5 µmRz=2.5 µmRz=7 µm

Page 16: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

16

IEEE2011

100μm 100μm 100μm

10μm10μm10μm

Copper Roughness ; Etching EffectCopper Roughness ; Etching Effect

Standard VLP Profile-free

●●●●●●●● ClossClossClossCloss----section of stripe line : Line width 100 section of stripe line : Line width 100 section of stripe line : Line width 100 section of stripe line : Line width 100 µµµµmmmm, Thickness 18 , Thickness 18 , Thickness 18 , Thickness 18 µµµµm m m m

Page 17: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

17

IEEE2011

Transmission Loss Evaluation (Up to 20 GHz)

(- Copper Impact)

(2) Measurement Method

Agilent:E8364BMeasurement condition:Strip-line resonator method S21 (Zo:50 Ω)

Strip-Line Structure

Prepreg (100 μm)

18 μm Copper (1/2 Oz.)

Core (100 μm)

Test Board

(1) Copper Foils

Base Material Copper Supplier

PF foil Hitachi original

HVLP foil F

VLP foil M

Std. foil N

MCL-FX-2

Page 18: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

18

IEEE2011

MCL-FX-2 Transmission Loss (Various Copper foils)

Transmission Loss (- Copper Impact)

-70

-60

-50

-40

-30

-20

-10

0

0 5 10 15 20Frequency (GHz)

Transmission Loss (dB/m)

PF foil

HVLP foil

VLP foil

Std. foil

Page 19: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

19

IEEE2011

MCL-LX-67Yの一般特性

General Properties of FX-3

Glass Fabric Type - - E NE

Dk 1 GHz 3.40 - 3.45 3.15 - 3.20

3 GHz 3.40 - 3.45 3.15 - 3.20

Df 1 GHz 0.0024 - 0.0029 0.0020 - 0.0025

3 GHz 0.0034 - 0.0039 0.0024 - 0.0028

Copper Peel Strength Standard (18 µm) 0.8 - 0.9 0.8 - 0.9

VLP (18 µm) 0.6 - 0.7 0.6 - 0.7

PF (18 µm) 0.7 - 0.8 0.7 - 0.8

Td TGA 5 % loss oC 370 - 390 370 - 390

Tg TMA oC 175 - 185 175 - 185

CTE αx1 14 - 17 14 - 17

αz1 45 - 55 45 - 55

αz2 100 - 130 100 - 130

Solder Resistance 288 oC/20 s

*1 > 5 h > 5 h

Water Absorption PCT-5 h wt% 0.20 - 0.30 0.20~0.30

*1) PCT(121 oC/0.22 MPa)

Item Cond. Unit FX-3FX-2

ppm/oC

kN/m

IPC-TM650

2.5.5.1

-

-

Page 20: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

20

IEEE2011

0

0.002

0.004

0.006

0.008

0.010

0 2 4 6 8 10

Frequency(GHz)

Dissipation factor (Df)

3.1

3.2

3.3

3.4

3.5

3.6

3.7

3.8

0 2 4 6 8 10

Frequency (GHz)

Dielectric Constant (D

k)

FX-2 (VLP)

<<<< Measurement Conditions >>>>

/ Method: Triplate-Line Resonator by Vector Network Analyzer (JPCA-TM0001,IPC-TM-650 2.5.5.1)/ Temperature & Humidity: 25 ℃/ 60 %RH

/ Laminate Thickness: 0.8 mm (Signal-Ground Distance: 800 µm), Copper foil:18 µm/ Signal Conductor Line Width: 1 mm (Zo: approx.50 Ω)

FX-2 (VLP) FX-2 (PF)FX-2 (PF)

FX-3 (VLP)FX-3 (VLP)

Dielectric Properties (vs. Frequency)

Excellent stability of dielectric properties in wide frequency bands

Page 21: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

21

IEEE2011

Electrical Performance in High Frequencies

<<<< Measurement Conditions >>>>/ Evaluation PWB: Strip-Line Structure/ Material: FX-2, FX-3/ Temperature & Humidity: 25 ℃/60 %RH/ Characteristic Impedance: 50 Ω/ Connection:Though Hole-SMA (by Solder)

/ Inner Layer Surface Treatment: Reduction Treatment

Transmission Loss((((S-Parameter(S21)))))

wb t

<<<< Evaluation System >>>>

・Line-Width (w):0.124~0.138 mm・Dielectric Thickness (b):0.26 mm

・Copper Thickness (t):18 µm・Line-Length:500 mm

/ Dimension Parameters

V-NA

Testing Board

Frequency (GHz)

Transmission Loss (dB/m

)

FR-4

FX-2++++VLP

FX-3++++VLP

FX-3+HVLP

-40

-35

-30

-25

-20

-15

-10

-5

0

0 1 2 3 4 5 6

Page 22: MCL -FX -2 / FX -3 - IEEE 802 · 2011-11-09 · 5 IEEE2011 Low Dk& Low Df Thermosetting resin system (Low-polar cross-linking design) Non-polar & Rigid Liner polymer Semi-IPN structure

22

IEEE2011

Conclusions

1. Several factor need to be considered for 100G

channel construction

(1) Resin system, resin content

(2) Filler, filler size and coating

(3) Copper foil roughness

(4) Glass wave impact

2. Demonstrated two materials (FX-2/FX-3) can meet

1M channel objective reach.