光偵測器 Photodetectors

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光光光光 Photodetectors

description

光偵測器 Photodetectors. Principle of the pn Junction Photodiode. Photodetector 光偵測器乃是將光訊號轉成電壓或電流等電訊號。 其中 pn junction photodiode 具有體積小、高速以及靈敏度高等特點。 Photodiode 通常在逆偏下操作。. - PowerPoint PPT Presentation

Transcript of 光偵測器 Photodetectors

Page 1: 光偵測器 Photodetectors

光偵測器 Photodetectors

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(a) A schematic diagram of a reverse biased pn junction photodiode. (b) Net space charge across the diode in the depletion region. Nd and Na are the donor and acceptor concentrations in the p and n sides. (c). The field in the depletion region.

Photodetector 光偵測器乃是將光訊號轉成電壓或電流等電訊號。其中 pn junction photodiode 具有體積小、高速以及靈敏度高等特點。

Photodiode 通常在逆偏下操作。

Principle of the pn Junction Photodiode

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(a) An EHP is photogenerated at x = l. The electron and the hole drift in opposite directions with drift velocities vh and ve. (b) The electron arrives at timete = (L l)/ve and the hole arrives at time th = l/vh. (c) As the electron and hole drift, each generates an external photocurrent shown as ie(t) and ih(t). (d) The total photocurrent is the sum of hole and electron photocurrents each lasting a duration th and te respectively.

Work done ( )

( ) ;

e

ee e

eEdx Vi t dt

evi t t t

L

( ) ; hh h

evi t t t

L0 0

( ) ( ) e ht t

collected e hQ i t dt i t dt e

Ramo’s theorem

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Absorption Coefficient and Photodiode Materials

1.24upper cut-off wavelength ( m)

(eV) g

gE

TABLE Band gap energy Eg at 300 K, cut-off wavelength g and type of bandgap (D = Direct and I = Indirect) for some photodetector materials.

Semiconductor Eg (eV) g (m) Type

InP 1.35 0.91 D GaAs0.88Sb0.12 1.15 1.08 D Si 1.12 1.11 I In0.7Ga0.3As0.64P0.36 0.89 1.4 D In0.53Ga0.47As 0.75 1.65 D Ge 0.66 1.87 I InAs 0.35 3.5 D InSb 0.18 7 D

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Absorption coefficient (α) vs. wavelength (λ) for various semiconductors (Data selectively collected and combined from various sources.)

The light intensity I at a distance x from semiconductor surfaceI(x) = I0exp(x) : absorption coefficient

: penetration depth = 1/

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(a) Photon absorption in a direct bandgap semiconductor. (b) Photon absorption in an indirect bandgap semiconductor (VB, valence band; CB, conduction band)

: phonon energy

gh E h

h

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Quantum Efficiency and Responsivity偵測器的 quantum efficiency(QE)

0

Number of free EHP generated and collected

Number of incident photons

/

/phI e

P h

此又稱 external QE ,(Internal QE 為每個被吸收的光子所產生的 EHP 數 )

responsivity R 為單位入射光功率所產生的光電流,

0

Photocurrent (A)

Inciedent Optical Power (W)

ph

R

I e e

P h hc

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The pin Photodiode

單純的 pn junction photodiode 有兩個主要缺點: 空乏區電容不夠小,此對高頻調制訊號的偵測不利。 空乏區寬度最多只有數微米,可能小於長波長之穿透深度,此會造成光子主要在空乏區外被吸收,無法被電場分離。

pin(p-intrinsic-n) photodiode

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(a) The schematic structure of an idealized pin photodiode

(b) The net space charge density across the photodiode.

(c) The built-in field across the diode.(d) The pin photodiode in photodetection

is reverse biased.

0 pf

~ 50 ps

r

dep

dep

AC

WRC

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Drift velocity vd vs. electric field for holes and electrons in Si.

tdrift = W/vd

vd = dE at low field

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Example: A Si pin photodiode has an i-Si layer of width 20 μm. The p+ layer on the illumination side is very thin (0.1 μm). The pin is reverse biased by a voltage of 100 V and then illuminated with a very short optical pulse of wavelength 900 nm. What is the duration of the photocurrent if absorption occurs over the whole i-Si layer?

absorption coefficient ~ 4104 m–1

6 6/ (100 V)/(20 10 ) 5 10 V/mrE V W

4

9

2 10 V/s

/ 1 10 sh

h h

v

t W v

absorption depth ~ 25 m >> 0.1 m有效的光子吸收在 i-Si 層

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Example: A Si pin photodiode has an active light receiving area of diameter 0.4 mm. When radiation of wavelength 700 nm (red light) and intensity 0.1 mW/cm2 is incident it generates a photocurrent of 56.6 nA. What is the responsivity and QE of the photodiode at 700 nm?

2 3 2(0.02 cm) (10 W/cm ) 0.126 oP AI W

9/ (56.6 10 A)/(0.126 ) 0.45 A/Wph oR I P W

the responsivity

the QE34 8

19 9

(6.62 10 Js)(3 10 m/s)(0.45 A/W) 0.80 80%

(1.6 10 C)(700 10 m)hc

Re

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(a) A schematic illustration of the structure of an avalanche photodiode (APD) biased for avalanche gain.(b) The net space charge density across the photodiode.(c) The field across the diode and the identification of absorption and multiplication regions.

Avalanche Photodiode (APD)

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(a) A pictorial view of impact ionization processes releasing EHPs and the resulting avalanche multiplication. (b) Impact of an energetic conduction electron with crystal vibrations transfers the electron's kinetic energy to a valence electron and thereby excites it to the conduction band.

一個光子在 APD 中可產生多個 EHP ,因此其 effective QE 會大於 1 。其倍數 avalanche multiplication factor M 為 reverse bias Vr 的函數

Multiplied photocurrent 1

Primary unmultiplied photocurrent1

ph

npho r

br

IM

I VV

Vbr : avalanche breakdown voltage,

n : characteristic index

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(a) A Si APD structure without a guard ring. (b) A schematic illustration of the structure of a more practical Si APD

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Photodioderange

nm

peak

nm

R at peak

A/WGain

tr

(ns) Idark

Si pn junction 200-1100

600-900

0.5-0.6 <1 0.5 0.01-0.1 nA

Si pin 300-1100

800-900

0.5-0.6 <1 0.03-0.05

0.01-0.1 nA

Si APD 400-1100

830-900

40-130 10-100

0.1 1-10 nA

Ge pn junction 700-1800

1500-1600

0.4-0.7 <1 0.05 0.1-1 μA

Ge APD 700-1700

1500-1600

4-14 10-20 0.1 1-10 μA

InGaAs-InP pin 800-1700

1500-1600

0.7-0.9 <1 0.03-0.1

0.1-10 nA

InGaAs-InP APD

800-1700

1500-1600

7-18 10-20 0.07-0.1

10-100 nA

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Example: A Si APD has a QE of 70% at 830 nm in the absence of multiplication, that is M = 1. The APD is biased to operate with multiplication of 100. If the incident optical power is 10 nW what is the photocurrent?

The unmultiplied responsivity is

19 9

34 8

(1.6 10 )(830 10 )(0.70) 0.47 A/W

(6.626 10 )(3 10 )e

Rhc

9(0.47A/W)(10 10 W) 4.7 nApho oI RP

(100)(4.7 nA) 470 nAph phoI MI

The multiplied photocurrent is

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Heterojunction Photodiodes

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Phototransistors

The principle of operation of the photodiode. SCL is the space chargelayer or the depletion region. The primary photocurrent acts as a base current and gives rise to a large photocurrent in the emitter-collector circuit.

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A semiconductor slab of length l, width w and depth d is illuminated with light of wavelength .

Photoconductive Detectors

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光伏元件 Photovoltaic Devices

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太陽輻射密度約 1.4 kW/m2

AM: Air MassAM0: above Earth’s atmosphere 1.353 kW/m2

AM1: 太陽直射之 air mass ( = 0)AM1.5: 太陽入射角 滿足 sec = 1.5 之 air mass

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Finger electrodes on the surface of a solar cell reduce the series resistance

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pn Junction Photovoltaic I-V Characteristics

(a) The solar cell connected to an external load R and the convention for the definitions of positive voltage and positive current. (b) The solar cell in short circuit. The current is the photocurrent, Iph. (c) The solar cell driving an external load R. There is a voltage V and current I in the circuit.

0 exp 1d ph phB

eVI I I I I

nk T

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m m

sc oc

I VFF

I V

Filling Factor

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The equivalent circuit of a solar cell

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The series resistance broadens the I-V curve and reduces the maximumavailable power and hence the overall efficiency of the solar cell. The example is a Si solar cell with n 1.5 and Io 3 × 10-6 mA. Illumination is such that the photocurrent Iph = 10 mA.